Object substitution masking occurs when a lateral mask persists beyond the duration of a target, reflecting reentrant processes in vision (V. Di Lollo, J. Enns, & R. Rensink, 2000). The authors studied whether substitution masking is location specific and whether it is symmetric around the target. A brief circular display of letters was presented along with a mask that designated the target. The mask was centered on the target or 1.1 degrees to the central or to the peripheral side. Substitution masking was found even when the target and the mask were at different locations. It was asymmetric and stronger when the mask was to the peripheral side of the target than to the central side. Asymmetric substitution was observed using various masks. It could not be explained by retina acuity gradients and was not attenuated by focused attention. The authors propose that target selection triggers an asymmetric inhibitory surround that is stronger toward the central side of the target.