Focused ion beam (FIB) techniques can prepare site-specific transmission electron microscopy (TEM) cross-section samples very quickly but they suffer from beam damage by the high energy Ga+ ion beam. An amorphous layer about 20-30 nm thick on each side of the TEM lamella and the supporting carbon film makes FIB-prepared samples inferior to the traditional Ar+ thinned samples for some investigations such as high resolution transmission electron microscopy (HRTEM) and electron energy loss spectroscopy (EELS). We have developed techniques to combine broad argon ion milling with focused ion beam lift-out methods to prepare high-quality site-specific TEM cross-section samples. Site-specific TEM cross-sections were prepared by FIB and lifted out using a Narishige micromanipulator onto a half copper-grid coated with carbon film. Pt deposition by FIB was used to bond the lamellae to the Cu grid, then the coating carbon film was removed and the sample on the bare Cu grid was polished by the usual broad beam Ar+ milling. By doing so, the thickness of the surface amorphous layers is reduced substantially and the sample quality for TEM observation is as good as the traditional Ar+ milled samples.