Bond-detach lithography: a method for micro/nanolithography by precision PDMS patterning

Small. 2007 Jan;3(1):132-8. doi: 10.1002/smll.200500418.


We have discovered a micro/nanopatterning technique based on the patterning of a PDMS membrane/film, which involves bonding a PDMS structure/stamp (that has the desired patterns) to a PDMS film. The technique, which we call "bond-detach lithography", was demonstrated (in conjunction with other microfabrication techniques) by transferring several micro- and nanoscale patterns onto a variety of substrates. Bond-detach lithography is a parallel process technique in which a master mold can be used many times, and is particularly simple and inexpensive.

Publication types

  • Research Support, N.I.H., Extramural
  • Research Support, U.S. Gov't, Non-P.H.S.

MeSH terms

  • Chemical Phenomena
  • Chemistry
  • Crystallization / methods*
  • Dimethylpolysiloxanes / chemistry*
  • Gases
  • Hot Temperature
  • Macromolecular Substances / chemistry
  • Materials Testing
  • Microchemistry / methods*
  • Molecular Conformation
  • Nanostructures / chemistry*
  • Nanostructures / ultrastructure*
  • Nanotechnology / methods*
  • Nylons / chemistry*
  • Particle Size
  • Surface Properties


  • Dimethylpolysiloxanes
  • Gases
  • Macromolecular Substances
  • Nylons
  • poly(dimethylsiloxane)-polyamide copolymer