A simple top-down/bottom-up approach to sectored, ordered arrays of nanoscopic elements using block copolymers

Small. 2009 May;5(9):1064-9. doi: 10.1002/smll.200801573.

Abstract

A top-down/bottom-up approach is demonstrated by combining electron-beam (e-beam) lithography and a solvent annealing process. Micellar arrays of polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) with a high degree of lateral order can be produced on a surface where sectoring is defined by e-beam patterning. The e-beam is used to crosslink the block copolymer (BCP) film immediately after spin-coating when the BCP is disordered or in a highly ordered solvent-annealed film. Any patterns can be written into the BCP by crosslinking. Upon exposure to a preferential solvent for the minor component block followed by drying, cylindrical nanopores are generated within the nonexposed areas by a surface reconstruction process, while, in the exposed areas, the films remain unchanged. Nickel nanodot arrays can be placed over selected areas on a surface by thermal evaporation and lift-off process.

Publication types

  • Research Support, Non-U.S. Gov't
  • Research Support, U.S. Gov't, Non-P.H.S.

MeSH terms

  • Crystallization / methods*
  • Macromolecular Substances / chemistry
  • Materials Testing
  • Molecular Conformation
  • Nanostructures / chemistry*
  • Nanostructures / ultrastructure*
  • Nanotechnology / methods*
  • Particle Size
  • Polystyrenes / chemistry*
  • Polyvinyls / chemistry*
  • Surface Properties

Substances

  • Macromolecular Substances
  • Polystyrenes
  • Polyvinyls
  • poly(styrene)-block-poly(4-vinylpyrindine) diblock copolymer