Atomic layer deposited (ALD) TiO(2) and TiO(2-x)-N(x) thin film photocatalysts in salicylic acid decomposition

Water Sci Technol. 2009;60(10):2471-5. doi: 10.2166/wst.2009.660.

Abstract

Degradation of salicylic acid (SA) with thin film photocatalyst, titanium dioxide (TiO(2)) and nitrogen-doped TiO(2) (TiO(2-x)-N(x)) combined with ultraviolet (UV) radiation was studied. TiO(2) film with thickness of 15 and 65 nm was tested. The TiO(2-x)-N(x) film had thickness of 15 nm on top of TiO(2) (50 nm). Photocatalysts were prepared on glass substrate by atomic layer deposition (ALD) technique. The effect of initial pH (3-10) was studied with SA concentration of 10 mg/l. Decomposition of SA was fastest at pH 6 with both films and the rate was equal at initial pH values 3 and 4.3. However, at higher pH values the non-doped film was more efficient.

Publication types

  • Research Support, Non-U.S. Gov't

MeSH terms

  • Catalysis
  • Hydrogen-Ion Concentration
  • Nitrogen / chemistry*
  • Photochemical Processes
  • Salicylic Acid / chemistry*
  • Titanium / chemistry*
  • Ultraviolet Rays
  • Water Pollutants, Chemical / chemistry*
  • Water Purification

Substances

  • Water Pollutants, Chemical
  • titanium dioxide
  • Titanium
  • Nitrogen
  • Salicylic Acid