Patterning microfluidic device wettability using flow confinement

Lab Chip. 2010 Jul 21;10(14):1774-6. doi: 10.1039/c004124f. Epub 2010 May 21.


We present a simple method to spatially pattern the surface properties of microfluidic devices using flow confinement. Our technique allows surface patterning with micron-scale resolution. To demonstrate its effectiveness, we use it to pattern wettability to form W/O/W and O/W/O double emulsions.