The application of plasma-enhanced chemical vapour deposition (PECVD) in the production and modification of carbon nanotubes (CNTs) will be reviewed. The challenges of PECVD methods to grow CNTs include low temperature synthesis, ion bombardment effects and directional growth of CNT within the plasma sheath. New strategies have been developed for low temperature synthesis of single-walled CNTs based the understanding of plasma chemistry and modelling. The modification of CNT surface properties and synthesis of CNT hybrid materials are possible with the utilization of plasma.