We propose a simple, precise, and wafer-scale fabrication technique for Au double nanopillar (DNP) arrays with nanogaps of several tens of nanometers. An Au DNP was simply constructed by alternately laminating thin layers of Au and polymer on a template and selectively removing the thin layers. This DNP array was expected to exhibit a specific plasmonic property induced by its narrow gap. When measuring the refractive index sensitivity (RIS), Au DNP arrays with 33 nm gaps exhibited a high RIS of 1075 nm RIU(-1) and showed a higher sensor figure of merit than the alternative structures, which did not have a nanogap structure but had almost the same surface area. This indicated that the enhanced plasmon electromagnetic field induced by the nanogap structure improved sensor performance. Our fabrication technique and the optical properties of the nanogap structure will provide useful information for developing new plasmonic applications with nanogap structures.