M³: Microscope-based maskless micropatterning with dry film photoresist

Biomed Microdevices. 2011 Apr;13(2):375-81. doi: 10.1007/s10544-010-9506-2.

Abstract

We present a maskless micropatterning system that utilizes a fluorescence microscope with programmable X-Y stage and dry film photoresist to realize feature sizes in the sub-millimeter range (40-700 μm). The method allows for flexible in-house maskless photolithography without a dedicated microfabrication facility and is well-suited for rapid prototyping of microfluidic channels, scaffold templates for protein/cell patterning or optically-guided cell encapsulation for biomedical applications.

Publication types

  • Research Support, N.I.H., Extramural
  • Research Support, U.S. Gov't, Non-P.H.S.

MeSH terms

  • Light*
  • Microfluidic Analytical Techniques
  • Microscopy, Fluorescence / methods*
  • Microtechnology / methods*
  • Printing
  • Time Factors