Complex dynamic substrate control: dual-tone hydrogel photoresists allow double-dissociation of topography and modulus

Adv Mater. 2014 Mar 12;26(10):1577-83. doi: 10.1002/adma.201304591. Epub 2013 Dec 12.

Abstract

Complex substrate control is demonstrated with a dual-tone hydrogel photoresist. By exposing a photodegradable hydrogel to UV light through a photomask, both swollen and eroded micropatterns with a decreased modulus can be created on the surface under different exposure conditions. This provides an important tool for investigating the synergistic effects of spatially heterogeneous mechanical and topological cues on cell behavior.

Keywords: complex topographic patterns; dual-tone photoresist; dynamic control; elastic pattern; photodegradable hydrogels.

Publication types

  • Research Support, N.I.H., Extramural

MeSH terms

  • Biocompatible Materials / chemistry*
  • Hydrogel, Polyethylene Glycol Dimethacrylate / chemistry*
  • Photolysis*
  • Polyethylene Glycols / chemistry

Substances

  • Biocompatible Materials
  • Hydrogel, Polyethylene Glycol Dimethacrylate
  • Polyethylene Glycols