Whispering gallery mode microcavities are ideally suited to form microlaser devices because the high circulating intensity within the cavity results in ultralow lasing thresholds. However, to achieve low-threshold Raman lasing in silica devices, it is necessary to have quality factors above 100 million. One approach to circumvent this restriction is to intercalate a sensitizer into the silica, which increases the Raman gain. In the present work, we demonstrate a Raman laser based on a titanium sensitized silica solgel coated toroidal microcavity. By tuning the concentration of the Ti, the Raman efficiency improves over 3× while maintaining sub-mW thresholds.