In this work, we demonstrate that a preassembled block copolymer (BCP) thin film can be floated, transferred, and utilized to effectively nanopattern unconventional substrates. As target substrates, we chose Cu foil and graphene/Cu foil since they cannot be nanopatterned via conventional processes due to the high surface roughness and susceptibility to harsh processing chemicals and etchants. Perpendicular hexagonal PMMA cylinder arrays in diblock copolymer poly(styrene-block-methyl methacrylate) [P(S-b-MMA)] thin films were preassembled on sacrificial SiO2/Si substrates. The BCP thin film was floated at the air/water interface off of a SiO2/Si substrate and then collected with the target substrate, leading to well-defined nanoporous PS templates on these uneven surfaces. We further show that the nanoporous template can be used for a subtractive process to fabricate nanoperforated graphene on Cu foil in sub-20 nm dimension, and for an additive process to create aluminum oxide nanodot arrays without any polymeric residues or use of harsh chemicals and etchants.