Patterning microfluidic device wettability with spatially-controlled plasma oxidation

Lab Chip. 2015 Aug 7;15(15):3163-9. doi: 10.1039/c5lc00626k.

Abstract

Microfluidic devices can form double emulsions with uniform properties, but require cumbersome fabrication steps to pattern their wettability. We demonstrate spatially-controlled plasma oxidation to create wettability patterns for forming double emulsions. Our method performs comparably to chemical techniques but is simpler, more reliable, and scalable to patterning large arrays of drop makers.

Publication types

  • Research Support, N.I.H., Extramural
  • Research Support, U.S. Gov't, Non-P.H.S.

MeSH terms

  • Equipment Design
  • Microfluidic Analytical Techniques / instrumentation*
  • Oxidation-Reduction
  • Oxygen / chemistry
  • Plasma Gases / chemistry*
  • Wettability

Substances

  • Plasma Gases
  • Oxygen