Hierarchical Manipulation of Block Copolymer Patterns on 3D Topographic Substrates: Beyond Graphoepitaxy

Sungjune Park; Xiao Cheng; Alexander Böker; Larisa Tsarkova

doi:10.1002/adma.201601098

Hierarchical Manipulation of Block Copolymer Patterns on 3D Topographic Substrates: Beyond Graphoepitaxy

Adv Mater. 2016 Aug;28(32):6900-5. doi: 10.1002/adma.201601098. Epub 2016 Jun 6.

Authors

Sungjune Park¹, Xiao Cheng¹, Alexander Böker², Larisa Tsarkova¹

Affiliations

¹ DWI-Leibniz-Institute für Interaktiven Materialien and Institut für Physikalische Chemie, RWTH Aachen University, Forckenbeckstraße 50, 52056, Aachen, Germany.
² Fraunhofer-Institut für Angewandte Polymerforschung, Lehrstuhl für Polymermaterialien und Polymertechnologie, Universität Potsdam, Geiselbergstraße 69, 14476, Potsdam-Golm, Germany.

PMID: 27270877
DOI: 10.1002/adma.201601098

Abstract

Templates of complex nanopatterns in a form of hierarchically sequenced dots and stripes can be generated in block copolymer films on lithography-free 3D topographic substrates. The approach exploits thickness- and swelling-responsive morphological behavior of block copolymers, and demonstrates novel possibilities of topography-guided registration of nanopatterns due to periodic confinement and spontaneous orthogonal flow-fields.

Keywords: block copolymer lithography; buckled structures; hierarchical surface patterns; topographic substrates.