Investigation of Ultraviolet Light Curable Polysilsesquioxane Gate Dielectric Layers for Pentacene Thin Film Transistors

J Nanosci Nanotechnol. 2016 Apr;16(4):3327-31. doi: 10.1166/jnn.2016.12292.

Abstract

Polysilsesquioxane (PSQ) comprising 3-methacryloxypropyl groups was investigated as an ultraviolet (UV)-light curable gate dielectric-material for pentacene thin film transistors (TFTs). The surface of UV-light cured PSQ films was smoother than that of thermally cured ones, and the pentacene layers deposited on the UV-Iight cured PSQ films consisted of larger grains. However, carrier mobility of the TFTs using the UV-light cured PSQ films was lower than that of the TFTs using the thermally cured ones. It was shown that the cross-linker molecules, which were only added to the UV-light cured PSQ films, worked as a major mobility-limiting factor for the TFTs.

MeSH terms

  • Crystallization / methods
  • Electric Impedance
  • Equipment Design
  • Equipment Failure Analysis
  • Hardness / radiation effects
  • Membranes, Artificial*
  • Nanoparticles / chemistry*
  • Nanoparticles / radiation effects
  • Nanoparticles / ultrastructure
  • Naphthacenes / chemistry*
  • Organosilicon Compounds / chemistry*
  • Organosilicon Compounds / radiation effects
  • Transistors, Electronic*
  • Ultraviolet Rays

Substances

  • Membranes, Artificial
  • Naphthacenes
  • Organosilicon Compounds
  • polysilsesquioxane
  • pentacene