Wafer-scale fabrication of high-density nanoslit arrays for surface-enhanced Raman spectroscopy

Mingliang Jin; Yunfei Zhu; Albert van den Berg; Zhang Zhang; Guofu Zhou; Lingling Shui

doi:10.1088/0957-4484/27/49/49LT01

Wafer-scale fabrication of high-density nanoslit arrays for surface-enhanced Raman spectroscopy

Nanotechnology. 2016 Dec 9;27(49):49LT01. doi: 10.1088/0957-4484/27/49/49LT01. Epub 2016 Nov 10.

Authors

Mingliang Jin¹, Yunfei Zhu, Albert van den Berg, Zhang Zhang, Guofu Zhou, Lingling Shui

Affiliation

¹ Institute of Electronic Paper Displays, South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, People's Republic of China. Joint International Research Laboratory of Optical Information of the Chinese Ministry of Education, South China Normal University, Guangzhou 510006, People's Republic of China.

PMID: 27831932
DOI: 10.1088/0957-4484/27/49/49LT01

Abstract

Surfaces with a periodic nanostructure and controllable feature size are sought after for optical applications, and the fabrication of such surfaces in large areas with high reproducibility, good stability and low deviation is very important. We present a strategy to fabricate large-area nanoslit arrays with controllable pitches and gaps. Au nanoslit arrays with gaps down to around 10 nm and a high gap density of 2.0 × 10⁴ cm^-1 have been fabricated, which can greatly enhance the near-field electromagnetic field to achieve localized surface plasmon resonance (LSPR). An averaged surface-enhanced Raman scattering analytical enhancement factor of 8.0 × 10⁷ has been achieved on the substrate using a 633 nm laser source and the 'coupling effect' of LSPR of the nanoslits.