Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications

Adv Sci (Weinh). 2015 May 6;2(7):1500016. doi: 10.1002/advs.201500016. eCollection 2015 Jul.

Abstract

A parallel nanolithographic patterning method is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch-mask applications.

Keywords: block copolymer micelle nanolithography; glancing angle deposition; nanoimprint lithography; nanoparticle lithography; shadow growth physical vapor deposition.