In the present work, solution plasma process (SPP) with bubbling gas was used to prepare oligochitosan. The effect of SPP irradiation with bubbling gas on the degradation of chitosan was evaluated by the intrinsic viscosity reduction rate and the degradation kinetic. The formation of OH radical was studied. Changes of the physicochemical properties of chitosan were measured by scanning electron microscopy, X-ray diffraction, and thermogravimetric analysis, as well as ultraviolet-visible, Fourier-transform infrared, and 13C nuclear magnetic resonance spectroscopy. The results indicated an obvious decrease in the intrinsic viscosity reduction rate after SPP irradiation with bubbling gas, and that the rate with bubbling was higher than that without. The main chemical structure of chitosan remained intact after irradiation, but changes in the morphology, crystallinity, and thermal stability of oligochitosan were observed. In particular, the crystallinity and thermal stability tended to decrease. The present study indicated that SPP can be effectively used for the degradation of chitosan.
Keywords: Chitosan; Degradation; Plasma; Pulsed discharge.
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