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. 2011 May 17;4(5):929-940.
doi: 10.3390/ma4050929.

Nanohardness and Residual Stress in TiN Coatings

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Free PMC article

Nanohardness and Residual Stress in TiN Coatings

Luis Carlos Hernández et al. Materials (Basel). .
Free PMC article

Abstract

TiN films were prepared by the Cathodic arc evaporation deposition method under different negative substrate bias. AFM image analyses show that the growth mode of biased coatings changes from 3D island to lateral when the negative bias potential is increased. Nanohardness of the thin films was measured by nanoindentation, and residual stress was determined using Grazing incidence X ray diffraction. The maximum value of residual stress is reached at -100 V substrate bias coinciding with the biggest values of adhesion and nanohardness. Nanoindentation measurement proves that the force-depth curve shifts due to residual stress. The experimental results demonstrate that nanohardness is seriously affected by the residual stress.

Keywords: nanohardness; nanoindentation; negative substrate bias potential; residual stress.

Figures

Figure 1
Figure 1
Calotest measurement scheme.
Figure 2
Figure 2
Profile of load/unload in multi-cycle progressive nanoindentations.
Figure 3
Figure 3
Ball crater produced in the TiN coating over AISI 410 stainless steel substrate.
Figure 4
Figure 4
Afm images and Rrms of TiN Coatings: (a) 0 V and (b) −300 V.
Figure 5
Figure 5
The height distribution at different bias voltages: 0 V, 100 and −300 V.
Figure 6
Figure 6
Micrographs of failure events used in scratch testing for the TiN coatings with −300 V bias potential.
Figure 7
Figure 7
TiN Force-depth curve for multi-cycle progressive load in depth mode for coatings with −300 V bias substrate.
Figure 8
Figure 8
TiN coatings and AISI 410 substrate hardness values of each multi-cycle load plotted as a function of penetration depth.
Figure 9
Figure 9
Force-depth curves of standard nanoindentation test for TiN coatings with different bias voltage. (a) 0 V; (b) −100 V and (c) −300 V.

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References

    1. Lugscheider E., Barimani C., Wolf C., Guerriro S., Doepper G. Comparison of the structure of PVD-thin films deposited with different deposition energies. Surf. Coat. Technol. 1996;86-87:177–183.
    1. Boxman R.L., Sanders D.M., Martin P.J., Lafferty J.M. Handbook of Vacuum Arc Science and Technology. Noyes Publications; Park Ridge, NJ, USA: 1995.
    1. Hua M., Maa H.Y., Li J., Mok C.K. Tribological behaviours of patterned PVD TiN spot coatings on M2 steel coated with different bias voltages. Surf. Coat. Technol. 2006;200:3612–3625. doi: 10.1016/j.surfcoat.2005.05.003. - DOI
    1. Vieira R.A., Carmo M., Nono A. Characterization of Titanium Nitride thin films deposited by cathodic arc plasma technique on AISI D6 tool steel. Mater. Sci. Forum. 2005;498-499:717–721.
    1. Saoula N., Henda K., Kesri R. Influence of Nitrogen content on the structural and mechanical properties of tin thin films. J. Plasma Fusion Res. 2009;8:1403–1407.
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