We demonstrate that predepositing a nanometrically thin nickel film on a dielectric surface is sufficient to transform an amorphous pyrolyzed photoresist film (PPF) into a graphitic film (GRF) enriched with nickel particles. The GRF shows 3 orders of magnitude higher carrier mobility than the amorphous PPF, whereas its electrical conductivity doubles after etching away the nickel remains. The pronounced 2D peak in the Raman spectrum, almost dispersionless absorbance in the spectral range of 750-2000 nm, and the saturable absorption coefficient indicate that GRF possesses a graphene-like band structure. The proposed cost-efficient and scalable synthesis route opens avenues toward fabrication of micron size patterned graphitic structures of any shape directly on a dielectric substrate. Having graphene-like transport and electrical properties at 20 times higher absorbance than the single-layer graphene, GRF is attractive for fabrication of fast modulators for optical radiation, bolometers, and other photonics and optoelectronic devices that require enhanced optical absorption.
Keywords: absorption; direct deposition; electrical characterization; graphene; graphitic thin film (GRF); optical properties; pyrolyzed photoresist film (PPF); transport properties.