A new architecture for antireflection (AR) has been developed to break the trade-off between the optical transmittance and the electrical conduction impeding the performance of transparent conductive oxide (TCO) films. The tapered porous nanostructure with a complex continuous refractive index effectively eliminates reflections from the interfaces between air and the TCO and TCO and the substrate. Compared to the conventional TCO film, the AR TCO film exhibited the same electrical conduction, with an average transmittance of 88.7% in the 400-800 nm range, a 10.3% increase. The new AR TCO film is expected to improve the performance of various optoelectronic devices.
Keywords: antireflective film; nanostructure; transparent conductive oxide.