Water-Resistant Mechanoluminescent Electrospun Fabrics with Protected Sensitivity in Wet Condition via Plasma-Enhanced Chemical Vapor Deposition Process

Polymers (Basel). 2020 Jul 31;12(8):1720. doi: 10.3390/polym12081720.

Abstract

Mechanoluminescence (ML), which emits light upon external mechanical stress, was applied to fibrous composites. Herein, ML particles were incorporated into poly(vinylidene fluoride) (PVDF) and polyacrylonitrile (PAN) electrospun webs to prepare ML/PVDF and ML/PAN composite fabrics. The produced fabrics were treated with O2 and C4F8 plasma to modify the wetting properties, then the effects of composite wettability on the light-emitting response in dry and wet conditions were investigated. The light intensity was greatly decreased when the composite fabrics absorbed water. When the composites were hydrophobized by the C4F8 plasma-enhanced chemical vapor deposition process, the original light intensity was protected in wet conditions, while maintaining the water vapor transmission rate. As the clothing material would be exposed to moisture in varied situations, the reduced ML sensitivity in wet conditions may limit the application of ML composite fabrics. The findings suggest a facile strategy to fabricate moisture-resistant, breathable mechanoluminescence composite fabrics.

Keywords: electrospinning; mechanoluminescence; plasma-enhanced chemical vapor deposition; sensor; smart textile; water-resistant.