Synthesis of transition metal dichalcogenide van der Waals heterostructures through chemical vapor deposition

Yizhang Ren; Ling Zhang; Xukun Zhu; Huimin Li; Qizhi Dong; Song Liu

doi:10.1088/1361-648X/ac6309

Synthesis of transition metal dichalcogenide van der Waals heterostructures through chemical vapor deposition

J Phys Condens Matter. 2022 Apr 25;34(25). doi: 10.1088/1361-648X/ac6309.

Authors

Yizhang Ren¹, Ling Zhang¹, Xukun Zhu², Huimin Li¹, Qizhi Dong¹, Song Liu¹

Affiliations

¹ Institute of Chemical Biology and Nanomedicine (ICBN), State Key Laboratory of Chemo/Biosensing and Chemometrics, College of Chemistry and Chemical Engineering, Hunan University, Changsha 410082, People's Republic of China.
² Department of Chemistry, Southern University of Science and Technology, Shenzhen 518055, People's Republic of China.

PMID: 35358958
DOI: 10.1088/1361-648X/ac6309

Abstract

Transition metal dichalcogenide (TMD) van der Waals (vdW) heterostructures show great potential in the exploration of novel physical phenomena and practical applications. Compared to the traditional mechanical stacking techniques, chemical vapor deposition (CVD) method exhibits more advantages in preparing TMD vdW heterostructures. CVD enables the large-scale production of high-quality materials with clean interfaces in the future. Herein, CVD methods for the synthesis of TMD vdW heterostructures are summarized. These methods are categorized in two major strategies, multi-step process and one-step process. The effects of various factors are demonstrated, including the temperature, nucleation, and precursors. Finally, the remaining challenges are discussed.

Keywords: chemical vapor deposition (CVD); transition metal dichalcogenide (TMD); van der Waals heterostructure.