Protocol on irradiation-dark photochemical deposition and characterization of metal nanoclusters on semiconductor support

Haocheng Wu; Yi Zhu; Rongrong Jia; Liyi Shi; Lei Huang

doi:10.1016/j.xpro.2022.101459

Protocol on irradiation-dark photochemical deposition and characterization of metal nanoclusters on semiconductor support

STAR Protoc. 2022 Jun 15;3(3):101459. doi: 10.1016/j.xpro.2022.101459. eCollection 2022 Sep 16.

Authors

Haocheng Wu¹, Yi Zhu¹, Rongrong Jia¹, Liyi Shi², Lei Huang³

Affiliations

¹ Research Center of Nano Science and Technology, College of Sciences, Shanghai University, Shanghai 200444, P. R. China.
² Research Center of Nano Science and Technology, College of Sciences, Shanghai University, Shanghai 200444, P. R. China; Emerging Industries Institute, Shanghai University, Jiaxing, Zhejiang 314006, P. R. China.
³ Research Center of Nano Science and Technology, College of Sciences, Shanghai University, Shanghai 200444, P. R. China. Electronic address: leihuang@shu.edu.cn.

Abstract

Controlling the size and uniform dispersion of noble metal nanoclusters on the metal oxide based semiconductor are difficult due to the natural tendency for metal atoms to agglomerate. Here, we present the protocol for an "irradiation-dark" photochemical deposition to obtain uniform metal nanoclusters on semiconductor support, and the protocol for measuring the size and size distribution of metal nanoclusters. For complete details on the use and execution of this protocol, please refer to Wu et al. (2022).

Keywords: Chemistry; Material sciences.

Publication types

Research Support, Non-U.S. Gov't

MeSH terms

Metals*
Oxides
Semiconductors*

Substances

Metals
Oxides