Two-dimensional devices and integration towards the silicon lines

Nat Mater. 2022 Nov;21(11):1225-1239. doi: 10.1038/s41563-022-01383-2. Epub 2022 Oct 25.

Abstract

Despite technical efforts and upgrades, advances in complementary metal-oxide-semiconductor circuits have become unsustainable in the face of inherent silicon limits. New materials are being sought to compensate for silicon deficiencies, and two-dimensional materials are considered promising candidates due to their atomically thin structures and exotic physical properties. However, a potentially applicable method for incorporating two-dimensional materials into silicon platforms remains to be illustrated. Here we try to bridge two-dimensional materials and silicon technology, from integrated devices to monolithic 'on-silicon' (silicon as the substrate) and 'with-silicon' (silicon as a functional component) circuits, and discuss the corresponding requirements for material synthesis, device design and circuitry integration. Finally, we summarize the role played by two-dimensional materials in the silicon-dominated semiconductor industry and suggest the way forward, as well as the technologies that are expected to become mainstream in the near future.

Publication types

  • Review
  • Research Support, Non-U.S. Gov't

MeSH terms

  • Oxides / chemistry
  • Semiconductors*
  • Silicon* / chemistry

Substances

  • Silicon
  • Oxides