Aluminum nitride (AlN) is a wide-bandgap semiconductor (6.2 eV) with a broad transparency window spanning from the ultraviolet (UV) to the mid-infrared (MIR) wavelength region, making it a promising material for integrated photonics. In this work, AlN thin films using reactive RF sputtering are deposited, followed by annealing at 600 °C in a nitrogen atmosphere to reduce slab waveguide propagation losses. After annealing, the measured loss is 0.84 dB/cm at 978 nm, determined using the prism coupling method. A complete microfabrication process flow is then developed for the realization of optical channel waveguides. A key challenge in the processing of AlN is its susceptibility to oxidation when exposed to water or oxygen plasma, which significantly impacts device performance. The process is validated through the fabrication of microring resonators (MRRs), used to characterize the propagation losses of the AlN channel waveguides. The fabricated MRRs exhibit a quality factor of 12,000, corresponding to a propagation loss of 4.4 dB/cm at 1510-1515 nm. The dominant loss mechanisms are identified, and strategies for further process optimization are proposed.
Keywords: aluminum nitride (AlN) thin films; integrated photonics; optical waveguides.