Objective: The purpose of this study was to apply a quantitative approach to augmentation mentoplasty with Silastic implants to achieve consistently accurate results. A Silastic extension wafer was introduced for custom contouring implants as part of this technique.
Design: Case series.
Setting: Private practice.
Patients: One hundred patients undergoing elective facial cosmetic surgery. For the main outcome measure, ideal profile augmentation was defined as projecting the most anterior point of the patient's chin on profile to within 2 mm of a vertical line dropped from the lower lip.
Results: Using a quantitative approach, 98 of 100 patients were able to achieve ideal profile augmentation.
Conclusions: A quantitative approach to augmentation mentoplasty can provide consistently accurate results. Easy intraoperative customization of Silastic implants is necessary for this type of technique. A Silastic extension wafer is an effective method for intraoperative customization of implants.