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From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications.
Mai L, Mitschker F, Bock C, Niesen A, Ciftyurek E, Rogalla D, Mickler J, Erig M, Li Z, Awakowicz P, Schierbaum K, Devi A. Mai L, et al. Among authors: ciftyurek e. Small. 2020 Jun;16(22):e1907506. doi: 10.1002/smll.201907506. Epub 2020 Apr 28. Small. 2020. PMID: 32346997
Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices.
Mai L, Zanders D, Subaşı E, Ciftyurek E, Hoppe C, Rogalla D, Gilbert W, Arcos TL, Schierbaum K, Grundmeier G, Bock C, Devi A. Mai L, et al. Among authors: ciftyurek e. ACS Appl Mater Interfaces. 2019 Jan 23;11(3):3169-3180. doi: 10.1021/acsami.8b16443. Epub 2019 Jan 9. ACS Appl Mater Interfaces. 2019. PMID: 30624887