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A look underneath the SiO2/4H-SiC interface after N2O thermal treatments.
Fiorenza P, Giannazzo F, Swanson LK, Frazzetto A, Lorenti S, Alessandrino MS, Roccaforte F. Fiorenza P, et al. Among authors: alessandrino ms. Beilstein J Nanotechnol. 2013 Apr 8;4:249-54. doi: 10.3762/bjnano.4.26. Print 2013. Beilstein J Nanotechnol. 2013. PMID: 23616945 Free PMC article.