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Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors.
Merkx MJM, Angelidis A, Mameli A, Li J, Lemaire PC, Sharma K, Hausmann DM, Kessels WMM, Sandoval TE, Mackus AJM. Merkx MJM, et al. Among authors: hausmann dm. J Phys Chem C Nanomater Interfaces. 2022 Mar 17;126(10):4845-4853. doi: 10.1021/acs.jpcc.1c10816. Epub 2022 Mar 8. J Phys Chem C Nanomater Interfaces. 2022. PMID: 35330759 Free PMC article.
Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies.
Faraz T, Knoops HCM, Verheijen MA, van Helvoirt CAA, Karwal S, Sharma A, Beladiya V, Szeghalmi A, Hausmann DM, Henri J, Creatore M, Kessels WMM. Faraz T, et al. Among authors: hausmann dm. ACS Appl Mater Interfaces. 2018 Apr 18;10(15):13158-13180. doi: 10.1021/acsami.8b00183. Epub 2018 Apr 9. ACS Appl Mater Interfaces. 2018. PMID: 29554799 Free PMC article.