Heitmann RK[au] - Search Results

Year	Number of Results
1996	1
2002	2
2004	1
2006	2
2008	3
2010	1
2011	1
2018	1
2019	3
2020	1
2022	0

1

Optical design of diffraction-limited x-ray telescopes.

Chalifoux BD, Heilmann RK, Marshall HL, Schattenburg ML. Chalifoux BD, et al. Among authors: heilmann rk. Appl Opt. 2020 Jun 1;59(16):4901-4914. doi: 10.1364/AO.392479. Appl Opt. 2020. PMID: 32543486

2

Correcting flat mirrors with surface stress: analytical stress fields.

Chalifoux BD, Heilmann RK, Schattenburg ML. Chalifoux BD, et al. Among authors: heilmann rk. J Opt Soc Am A Opt Image Sci Vis. 2018 Oct 1;35(10):1705-1716. doi: 10.1364/JOSAA.35.001705. J Opt Soc Am A Opt Image Sci Vis. 2018. PMID: 30462091

3

Compensating film stress in thin silicon substrates using ion implantation.

Chalifoux BD, Yao Y, Woller KB, Heilmann RK, Schattenburg ML. Chalifoux BD, et al. Among authors: heilmann rk. Opt Express. 2019 Apr 15;27(8):11182-11195. doi: 10.1364/OE.27.011182. Opt Express. 2019. PMID: 31052966 Free article.

4

Thermal oxide patterning method for compensating coating stress in silicon substrates.

Yao Y, Chalifoux BD, Heilmann RK, Schattenburg ML. Yao Y, et al. Among authors: heilmann rk. Opt Express. 2019 Jan 21;27(2):1010-1024. doi: 10.1364/OE.27.001010. Opt Express. 2019. PMID: 30696174 Free article.

5

Demonstration of resolving power λ/Δλ > 10,000 for a space-based x-ray transmission grating spectrometer.

Heilmann RK, Kolodziejczak J, Bruccoleri AR, Gaskin JA, Schattenburg ML. Heilmann RK, et al. Appl Opt. 2019 Feb 10;58(5):1223-1238. doi: 10.1364/AO.58.001223. Appl Opt. 2019. PMID: 30873991

6

Design of a double-pass shear mode acousto-optic modulator.

Chang CH, Heilmann RK, Schattenburg ML, Glenn P. Chang CH, et al. Among authors: heilmann rk. Rev Sci Instrum. 2008 Mar;79(3):033104. doi: 10.1063/1.2894210. Rev Sci Instrum. 2008. PMID: 18376994

7

High-efficiency 5000 lines/mm multilayer-coated blazed grating for extreme ultraviolet wavelengths.

Voronov DL, Ahn M, Anderson EH, Cambie R, Chang CH, Gullikson EM, Heilmann RK, Salmassi F, Schattenburg ML, Warwick T, Yashchuk VV, Zipp L, Padmore HA. Voronov DL, et al. Among authors: heilmann rk. Opt Lett. 2010 Aug 1;35(15):2615-7. doi: 10.1364/OL.35.002615. Opt Lett. 2010. PMID: 20680076

8

Fabrication of 50 nm period gratings with multilevel interference lithography.

Chang CH, Zhao Y, Heilmann RK, Schattenburg ML. Chang CH, et al. Among authors: heilmann rk. Opt Lett. 2008 Jul 15;33(14):1572-4. doi: 10.1364/ol.33.001572. Opt Lett. 2008. PMID: 18628801

9

Near-normal-incidence extreme-ultraviolet efficiency of a flat crystalline anisotropically etched blazed grating.

Kowalski MP, Heilmann RK, Schattenburg ML, Chang CH, Berendse FB, Hunter WR. Kowalski MP, et al. Among authors: heilmann rk. Appl Opt. 2006 Mar 10;45(8):1676-9. doi: 10.1364/ao.45.001676. Appl Opt. 2006. PMID: 16572681

10

Blazed high-efficiency x-ray diffraction via transmission through arrays of nanometer-scale mirrors.

Heilmann RK, Ahn M, Gullikson EM, Schattenburg ML. Heilmann RK, et al. Opt Express. 2008 Jun 9;16(12):8658-69. doi: 10.1364/oe.16.008658. Opt Express. 2008. PMID: 18545579 Free article.

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