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SiGe epitaxy on a 300 mm batch furnace.
J Nanosci Nanotechnol. 2011 Sep;11(9):8040-3. doi: 10.1166/jnn.2011.5093.
J Nanosci Nanotechnol. 2011.
PMID: 22097526
Atomic layer deposition of ruthenium films on strontium titanate.
Kukli K, Kemell M, Lu J, Hultman L, Riedel S, Sundqvist J, Ritala M, Leskelä M.
Kukli K, et al. Among authors: sundqvist j.
J Nanosci Nanotechnol. 2011 Sep;11(9):8378-82. doi: 10.1166/jnn.2011.5045.
J Nanosci Nanotechnol. 2011.
PMID: 22097588
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