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Author Correction: Wafer-scale high-κ HfO2 dielectric films with sub-5-Å equivalent oxide thickness for 2D MoS2 transistors.
Zhang S, Zhang T, Yu H, Li T, Li X, Cui C, Zhou Y, Guo H, Wang S, Zheng D, Huang L, Bai L, Liu S, Shen C, Yang W, Du L, Shi D, Xian L, Tao X, Chai Y, Li N, Zhang G. Zhang S, et al. Among authors: shen c. Nat Commun. 2026 Apr 13;17(1):3444. doi: 10.1038/s41467-026-71971-2. Nat Commun. 2026. PMID: 41974686 Free PMC article. No abstract available.
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