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Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering.
Hajihoseini H, Kateb M, Ingvarsson SÞ, Gudmundsson JT. Hajihoseini H, et al. Among authors: gudmundsson jt. Beilstein J Nanotechnol. 2019 Sep 20;10:1914-1921. doi: 10.3762/bjnano.10.186. eCollection 2019. Beilstein J Nanotechnol. 2019. PMID: 31598457 Free PMC article.
Fabrication and characterization of Si1- x Ge x nanocrystals in as-grown and annealed structures: a comparative study.
Sultan MT, Maraloiu AV, Stavarache I, Gudmundsson JT, Manolescu A, Teodorescu VS, Ciurea ML, Svavarsson HG. Sultan MT, et al. Among authors: gudmundsson jt. Beilstein J Nanotechnol. 2019 Sep 17;10:1873-1882. doi: 10.3762/bjnano.10.182. eCollection 2019. Beilstein J Nanotechnol. 2019. PMID: 31598453 Free PMC article.
Efficacy of annealing and fabrication parameters on photo-response of SiGe in TiO2 matrix.
Sultan MT, Gudmundsson JT, Manolescu A, Teodorescu VS, Ciurea ML, Svavarsson HG. Sultan MT, et al. Among authors: gudmundsson jt. Nanotechnology. 2019 Sep 6;30(36):365604. doi: 10.1088/1361-6528/ab260e. Epub 2019 May 31. Nanotechnology. 2019. PMID: 31151130
Comparing resonant photon tunneling via cavity modes and Tamm plasmon polariton modes in metal-coated Bragg mirrors.
Leosson K, Shayestehaminzadeh S, Tryggvason TK, Kossoy A, Agnarsson B, Magnus F, Olafsson S, Gudmundsson JT, Magnusson EB, Shelykh IA. Leosson K, et al. Among authors: gudmundsson jt. Opt Lett. 2012 Oct 1;37(19):4026-8. doi: 10.1364/OL.37.004026. Opt Lett. 2012. PMID: 23027267
Ar+ and Xe+ velocities near the presheath-sheath boundary in an Ar/Xe discharge.
Gudmundsson JT, Lieberman MA. Gudmundsson JT, et al. Phys Rev Lett. 2011 Jul 22;107(4):045002. doi: 10.1103/PhysRevLett.107.045002. Epub 2011 Jul 18. Phys Rev Lett. 2011. PMID: 21867014
Digital smoothing of the Langmuir probe I-V characteristic.
Magnus F, Gudmundsson JT. Magnus F, et al. Among authors: gudmundsson jt. Rev Sci Instrum. 2008 Jul;79(7):073503. doi: 10.1063/1.2956970. Rev Sci Instrum. 2008. PMID: 18681700
A magnetron sputtering system for the preparation of patterned thin films and in situ thin film electrical resistance measurements.
Arnalds UB, Agustsson JS, Ingason AS, Eriksson AK, Gylfason KB, Gudmundsson JT, Olafsson S. Arnalds UB, et al. Among authors: gudmundsson jt. Rev Sci Instrum. 2007 Oct;78(10):103901. doi: 10.1063/1.2793508. Rev Sci Instrum. 2007. PMID: 17979429
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