Factors associated with mask wearing among psychiatric inpatients during the COVID-19 pandemic.
Jung HR, Park C, Kim M, Jhon M, Kim JW, Ryu S, Lee JY, Kim JM, Park KH, Jung SI, Yoon BH, Kim SW.
Jung HR, et al. Among authors: kim jm, kim sw, kim m, kim jw.
Schizophr Res. 2021 Feb;228:235-236. doi: 10.1016/j.schres.2020.12.029. Epub 2021 Jan 15.
Schizophr Res. 2021.
PMID: 33476952
Free PMC article.
No abstract available.