High-resolution soft lithography: enabling materials for nanotechnologies
Angew Chem Int Ed Engl
.
2004 Nov 5;43(43):5796-9.
doi: 10.1002/anie.200461122.
Authors
Jason P Rolland
1
,
Erik C Hagberg
,
Ginger M Denison
,
Kenneth R Carter
,
Joseph M De Simone
Affiliation
1
Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, NC, 27599, USA.
PMID:
15478218
DOI:
10.1002/anie.200461122
No abstract available