All-photonic drying and sintering process via flash white light combined with deep-UV and near-infrared irradiation for highly conductive copper nano-ink

Hyun-Jun Hwang; Kyung-Hwan Oh; Hak-Sung Kim

doi:10.1038/srep19696

All-photonic drying and sintering process via flash white light combined with deep-UV and near-infrared irradiation for highly conductive copper nano-ink

Sci Rep. 2016 Jan 25:6:19696. doi: 10.1038/srep19696.

Authors

Hyun-Jun Hwang¹, Kyung-Hwan Oh¹, Hak-Sung Kim^{1

2}

Affiliations

¹ Department of Mechanical Engineering, Hanyang University, Haengdang-dong, Seongdong-gu, Seoul 133-791, South Korea.
² Institute of Nano Science and Technology, Hanyang University, Seoul, 133-791, Korea.

Abstract

We developed an ultra-high speed photonic sintering method involving flash white light (FWL) combined with near infrared (NIR) and deep UV light irradiation to produce highly conductive copper nano-ink film. Flash white light irradiation energy and the power of NIR/deep UV were optimized to obtain high conductivity Cu films. Several microscopic and spectroscopic characterization techniques such as scanning electron microscopy (SEM), a x-ray diffraction (XRD), and Fourier-transform infrared (FT-IR) spectroscopy were employed to characterize the Cu nano-films. Optimally sintered Cu nano-ink films produced using a deep UV-assisted flash white light sintering technique had the lowest resistivity (7.62 μΩ·cm), which was only 4.5-fold higher than that of bulk Cu film (1.68 μΩ•cm).

Publication types

Research Support, Non-U.S. Gov't