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Directed Self-Assembly of Triblock Copolymer on Chemical Patterns for Sub-10-nm Nanofabrication via Solvent Annealing.
ACS Nano. 2016 Aug 23;10(8):7855-65. doi: 10.1021/acsnano.6b03667. Epub 2016 Aug 10.
ACS Nano. 2016.
PMID: 27482932
Directed self-assembly of high-chi block copolymer for nano fabrication of bit patterned media via solvent annealing.
Xiong S, Chapuis YA, Wan L, Gao H, Li X, Ruiz R, Nealey PF.
Xiong S, et al. Among authors: chapuis ya.
Nanotechnology. 2016 Oct 14;27(41):415601. doi: 10.1088/0957-4484/27/41/415601. Epub 2016 Sep 8.
Nanotechnology. 2016.
PMID: 27606926
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Transfer of self-aligned spacer patterns for single-digit nanofabrication.
Doerk GS, Gao H, Wan L, Lille J, Patel KC, Chapuis YA, Ruiz R, Albrecht TR.
Doerk GS, et al. Among authors: chapuis ya.
Nanotechnology. 2015 Feb 27;26(8):085304. doi: 10.1088/0957-4484/26/8/085304. Epub 2015 Feb 6.
Nanotechnology. 2015.
PMID: 25656564
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