Comparison of the Atomic Layer Deposition of Tantalum Oxide Thin Films Using Ta(NtBu)(NEt2)3, Ta(NtBu)(NEt2)2Cp, and H2O.
Song SJ, Park T, Yoon KJ, Yoon JH, Kwon DE, Noh W, Lansalot-Matras C, Gatineau S, Lee HK, Gautam S, Cho DY, Lee SW, Hwang CS.
Song SJ, et al. Among authors: lee sw, lee hk.
ACS Appl Mater Interfaces. 2017 Jan 11;9(1):537-547. doi: 10.1021/acsami.6b11613. Epub 2016 Dec 20.
ACS Appl Mater Interfaces. 2017.
PMID: 27936581