Nail salon dust reveals alarmingly high photoinitiator levels: Assessing occupational risks.
Shen J, Liu J, Ji X, Liang J, Feng X, Liu X, Wang Y, Zhang Q, Zhang Q, Qu G, Yan B, Liu R.
Shen J, et al. Among authors: feng x.
J Hazard Mater. 2024 Jun 13;475:134913. doi: 10.1016/j.jhazmat.2024.134913. Online ahead of print.
J Hazard Mater. 2024.
PMID: 38880048