Engineering Carrier Density and Effective Mass of Plasmonic TiN Films by Tailoring Nitrogen Vacancies.
Zhang S, Sun TY, Wang Z, Zhang R, Lin Y, Xiao S, Su G, Bi J, Li P, Zhang H, Liang L, Yang F, Zhang Q, Huang LF, Cao Y.
Zhang S, et al. Among authors: sun ty.
Nano Lett. 2024 Sep 24. doi: 10.1021/acs.nanolett.4c03534. Online ahead of print.
Nano Lett. 2024.
PMID: 39315654