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The Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer Lithography.
Chem Mater. 2020;32(6):https://doi.org/10.1021/acs.chemmater.9b04833.
Chem Mater. 2020.
PMID: 33100517
Free PMC article.
Cation-Deficiency-Induced Crystal-Site Engineering for ZnGa2O4:Mn2+ Thin Film.
Dazai T, Yasui S, Taniyama T, Itoh M.
Dazai T, et al.
Inorg Chem. 2020 Jul 6;59(13):8744-8748. doi: 10.1021/acs.inorgchem.0c00359. Epub 2020 Jun 7.
Inorg Chem. 2020.
PMID: 32506904
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Ionic Liquids as Additives to Polystyrene- Block-Poly(Methyl Methacrylate) Enabling Directed Self-Assembly of Patterns with Sub-10 nm Features.
Chen X, Zhou C, Chen SJ, Craig GSW, Rincon-Delgadillo P, Dazai T, Miyagi K, Maehashi T, Yamazaki A, Gronheid R, Stoykovich MP, Nealey PF.
Chen X, et al. Among authors: dazai t.
ACS Appl Mater Interfaces. 2018 May 16;10(19):16747-16759. doi: 10.1021/acsami.8b02990. Epub 2018 May 3.
ACS Appl Mater Interfaces. 2018.
PMID: 29667409
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