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Yang Z, Ma X, Oswald RB, Roesky HW, Zhu H, Schulzke C, Starke K, Baldus M, Schmidt HG, Noltemeyer M.Yang Z, et al. Among authors: oswald rb.Angew Chem Int Ed Engl. 2005 Nov 4;44(43):7072-4. doi: 10.1002/anie.200502251.Angew Chem Int Ed Engl. 2005.PMID: 16217823No abstract available.
Yang Z, Ma X, Oswald RB, Roesky HW, Cui C, Schmidt HG, Noltemeyer M.Yang Z, et al. Among authors: oswald rb.Angew Chem Int Ed Engl. 2006 Mar 27;45(14):2277-80. doi: 10.1002/anie.200503940.Angew Chem Int Ed Engl. 2006.PMID: 16518790No abstract available.
Zhu H, Oswald RB, Fan H, Roesky HW, Ma Q, Yang Z, Schmidt HG, Noltemeyer M, Starke K, Hosmane NS.Zhu H, et al. Among authors: oswald rb.J Am Chem Soc. 2006 Apr 19;128(15):5100-8. doi: 10.1021/ja057731p.J Am Chem Soc. 2006.PMID: 16608344
So CW, Roesky HW, Magull J, Oswald RB.So CW, et al. Among authors: oswald rb.Angew Chem Int Ed Engl. 2006 Jun 12;45(24):3948-50. doi: 10.1002/anie.200600647.Angew Chem Int Ed Engl. 2006.PMID: 16671135No abstract available.
Yang Z, Ma X, Oswald RB, Roesky HW, Noltemeyer M.Yang Z, et al. Among authors: oswald rb.J Am Chem Soc. 2006 Sep 27;128(38):12406-7. doi: 10.1021/ja064035w.J Am Chem Soc. 2006.PMID: 16984177
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