An official website of the United States government
The .gov means it’s official.
Federal government websites often end in .gov or .mil. Before
sharing sensitive information, make sure you’re on a federal
government site.
The site is secure.
The https:// ensures that you are connecting to the
official website and that any information you provide is encrypted
and transmitted securely.
Wang K, He X, Yang X, Shi H.Wang K, et al.Acc Chem Res. 2013 Jul 16;46(7):1367-76. doi: 10.1021/ar3001525. Epub 2013 Mar 14.Acc Chem Res. 2013.PMID: 23489227Review.
Yang R, Wang K, Long L, Xiao D, Yang X, Tan W.Yang R, et al. Among authors: wang k.Anal Chem. 2002 Mar 1;74(5):1088-96. doi: 10.1021/ac010386b.Anal Chem. 2002.PMID: 11924968
He XX, Wang K, Tan W, Liu B, Lin X, He C, Li D, Huang S, Li J.He XX, et al. Among authors: wang k.J Am Chem Soc. 2003 Jun 18;125(24):7168-9. doi: 10.1021/ja034450d.J Am Chem Soc. 2003.PMID: 12797777
He X, Wang K, Tan W, Li J, Yang X, Huang S, Li D, Xiao D.He X, et al. Among authors: wang k.J Nanosci Nanotechnol. 2002 Jun-Aug;2(3-4):317-20. doi: 10.1166/jnn.2002.105.J Nanosci Nanotechnol. 2002.PMID: 12908257
Tan W, Wang K, He X, Zhao XJ, Drake T, Wang L, Bagwe RP.Tan W, et al. Among authors: wang l, wang k.Med Res Rev. 2004 Sep;24(5):621-38. doi: 10.1002/med.20003.Med Res Rev. 2004.PMID: 15224383Review.
Huang H, Wang K, Tan W, An D, Yang X, Huang S, Zhai Q, Zhou L, Jin Y.Huang H, et al. Among authors: wang k.Angew Chem Int Ed Engl. 2004 Oct 25;43(42):5635-8. doi: 10.1002/anie.200460371.Angew Chem Int Ed Engl. 2004.PMID: 15495203No abstract available.
He X, Duan J, Wang K, Tan W, Lin X, He C.He X, et al. Among authors: wang k.J Nanosci Nanotechnol. 2004 Jul;4(6):585-9. doi: 10.1166/jnn.2004.011.J Nanosci Nanotechnol. 2004.PMID: 15518391
Peng J, Xing X, Wang K, Tan W, He X, Huang S.Peng J, et al. Among authors: wang k.J Nanosci Nanotechnol. 2005 May;5(5):713-7. doi: 10.1166/jnn.2005.091.J Nanosci Nanotechnol. 2005.PMID: 16010926
Xing X, He X, Peng J, Wang K, Tan W.Xing X, et al. Among authors: wang k.J Nanosci Nanotechnol. 2005 Oct;5(10):1688-93. doi: 10.1166/jnn.2005.199.J Nanosci Nanotechnol. 2005.PMID: 16245529